CEA-LETI, Minatec Campus
Подтвержден адрес электронной почты в домене
A CMOS silicon spin qubit
R Maurand, X Jehl, D Kotekar-Patil, A Corna, H Bohuslavskyi, R Laviéville, ...
Nature communications 7 (1), 1-6, 2016
Scaling of trigate junctionless nanowire MOSFET with gate length down to 13 nm
S Barraud, M Berthome, R Coquand, M Cassé, T Ernst, MP Samson, ...
IEEE Electron Device Letters 33 (9), 1225-1227, 2012
Planar Fully depleted SOI technology: A Powerful architecture for the 20nm node and beyond
O Faynot, F Andrieu, O Weber, C Fenouillet-Béranger, P Perreau, ...
2010 International Electron Devices Meeting, 3.2. 1-3.2. 4, 2010
Performance of omega-shaped-gate silicon nanowire MOSFET with diameter down to 8 nm
S Barraud, R Coquand, M Casse, M Koyama, JM Hartmann, ...
IEEE Electron Device Letters 33 (11), 1526-1528, 2012
Probing the limits of gate-based charge sensing
MF Gonzalez-Zalba, S Barraud, AJ Ferguson, AC Betz
Nature communications 6 (1), 1-8, 2015
Nanoscaled MOSFET Transistors on Strained Si, SiGe, Ge Layers: Some Integration and Electrical Properties Features
TP Ernst, F Andrieu, O Weber, JM Hartmann, C Dupre, O Faynot, ...
ECS Transactions 3 (7), 947, 2006
Effect of discrete impurities on electron transport in ultrashort MOSFET using 3D MC simulation
P Dollfus, A Bournel, S Galdin, S Barraud, P Hesto
IEEE Transactions on Electron Devices 51 (5), 749-756, 2004
Few-electron edge-state quantum dots in a silicon nanowire field-effect transistor
B Voisin, VH Nguyen, J Renard, X Jehl, S Barraud, F Triozon, M Vinet, ...
Nano letters 14 (4), 2094-2098, 2014
Revisited parameter extraction methodology for electrical characterization of junctionless transistors
DY Jeon, SJ Park, M Mouis, M Berthomé, S Barraud, GT Kim, G Ghibaudo
Solid-State Electronics 90, 86-93, 2013
Strain-induced performance enhancement of trigate and omega-gate nanowire FETs scaled down to 10-nm width
R Coquand, M Casse, S Barraud, D Cooper, V Maffini-Alvaro, ...
IEEE transactions on electron devices 60 (2), 727-732, 2012
Low-temperature electrical characterization of junctionless transistors
DY Jeon, SJ Park, M Mouis, S Barraud, GT Kim, G Ghibaudo
Solid-State Electronics 80, 135-141, 2013
Dispersively detected Pauli spin-blockade in a silicon nanowire field-effect transistor
AC Betz, R Wacquez, M Vinet, X Jehl, AL Saraiva, M Sanquer, ...
Nano letters 15 (7), 4622-4627, 2015
Experimental and comparative investigation of low and high field transport in substrate-and process-induced strained nanoscaled MOSFETs
F Andrieu, T Ernst, F Lime, F Rochette, K Romanjek, S Barraud, C Ravit, ...
Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005., 176-177, 2005
Electrical Control of g-Factor in a Few-Hole Silicon Nanowire MOSFET
B Voisin, R Maurand, S Barraud, M Vinet, X Jehl, M Sanquer, J Renard, ...
Nano letters 16 (1), 88-92, 2016
3D analysis of advanced nano-devices using electron and atom probe tomography
A Grenier, S Duguay, JP Barnes, R Serra, G Haberfehlner, D Cooper, ...
Ultramicroscopy 136, 185-192, 2014
The influence of Coulomb centers located in gate stacks on the effective electron mobility
S Barraud, O Bonno, M Cassé
Journal of Applied Physics 104 (7), 073725, 2008
A new backscattering model giving a description of the quasi-ballistic transport in nano-MOSFET
E Fuchs, P Dollfus, G Le Carval, S Barraud, D Villanueva, F Salvetti, ...
IEEE transactions on electron devices 52 (10), 2280-2289, 2005
Vertically stacked-nanowires MOSFETs in a replacement metal gate process with inner spacer and SiGe source/drain
S Barraud, V Lapras, MP Samson, L Gaben, L Grenouillet, ...
2016 IEEE International Electron Devices Meeting (IEDM), 17.6. 1-17.6. 4, 2016
Gate-sensing coherent charge oscillations in a silicon field-effect transistor
MF Gonzalez-Zalba, SN Shevchenko, S Barraud, JR Johansson, ...
Nano letters 16 (3), 1614-1619, 2016
Electrical Spin Driving by -Matrix Modulation in Spin-Orbit Qubits
A Crippa, R Maurand, L Bourdet, D Kotekar-Patil, A Amisse, X Jehl, ...
Physical review letters 120 (13), 137702, 2018
В данный момент система не может выполнить эту операцию. Повторите попытку позднее.
Статьи 1–20