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Nazila Haratipour
Nazila Haratipour
Research Engineer, Components Research, Intel Corporation
Подтвержден адрес электронной почты в домене intel.com
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Процитировано
Процитировано
Год
Atomic and electronic structure of exfoliated black phosphorus
RJ Wu, M Topsakal, T Low, MC Robbins, N Haratipour, JS Jeong, ...
Journal of Vacuum Science & Technology A 33 (6), 2015
972015
Black Phosphorus p-MOSFETs With 7-nm HfO2Gate Dielectric and Low Contact Resistance
N Haratipour, MC Robbins, SJ Koester
IEEE Electron Device Letters 36 (4), 411-413, 2015
972015
Fundamental limits on the subthreshold slope in Schottky source/drain black phosphorus field-effect transistors
N Haratipour, S Namgung, SH Oh, SJ Koester
ACS nano 10 (3), 3791-3800, 2016
782016
Symmetric complementary logic inverter using integrated black phosphorus and MoS2 transistors
Y Su, CU Kshirsagar, MC Robbins, N Haratipour, SJ Koester
2D Materials 3 (1), 011006, 2016
612016
3d-ferroelectric random access memory (3d-fram)
S Shivaraman, SC Chang, AV Penumatcha, N Haratipour, UE Avci
US Patent App. 16/599,422, 2021
562021
Capacitive Sensing of Intercalated H2O Molecules Using Graphene
EJ Olson, R Ma, T Sun, MA Ebrish, N Haratipour, K Min, NR Aluru, ...
ACS applied materials & interfaces 7 (46), 25804-25812, 2015
512015
Asymmetric Metal/α-In2Se3/Si Crossbar Ferroelectric Semiconductor Junction
M Si, Z Zhang, SC Chang, N Haratipour, D Zheng, J Li, UE Avci, PD Ye
ACS nano 15 (3), 5689-5695, 2021
472021
Ambipolar black phosphorus MOSFETs with record n-channel transconductance
N Haratipour, SJ Koester
IEEE Electron Device Letters 37 (1), 103-106, 2015
462015
Applications of back-end-of-line (BEOL) capacitors in compute-in-memory (CIM) circuits
A Sharma, JT Kavalieros, IA Young, S Manipatruni, R Krishnamurthy, ...
US Patent 11,138,499, 2021
432021
Anti-ferroelectric HfxZr1-xO2 Capacitors for High-density 3-D Embedded-DRAM
SC Chang, N Haratipour, S Shivaraman, TL Brown-Heft, J Peck, CC Lin, ...
2020 IEEE International Electron Devices Meeting (IEDM), 28.1. 1-28.1. 4, 2020
432020
High-performance black phosphorus MOSFETs using crystal orientation control and contact engineering
N Haratipour, S Namgung, R Grassi, T Low, SH Oh, SJ Koester
IEEE Electron Device Letters 38 (5), 685-688, 2017
292017
Ferroelectric or anti-ferroelectric trench capacitor with spacers for sidewall strain engineering
N Haratipour, SC Chang, CC Lin, J Kavalieros, U Avci, I Young
US Patent 11,063,131, 2021
262021
A physics-based compact model for ultrathin black phosphorus FETs—Part I: Effect of contacts, temperature, ambipolarity, and traps
E Yarmoghaddam, N Haratipour, SJ Koester, S Rakheja
IEEE Transactions on Electron Devices 67 (1), 389-396, 2019
252019
Mobility Anisotropy in Black Phosphorus MOSFETs With HfO2Gate Dielectrics
N Haratipour, Y Liu, RJ Wu, S Namgung, PP Ruden, KA Mkhoyan, SH Oh, ...
IEEE Transactions on Electron Devices 65 (10), 4093-4101, 2018
222018
FeRAM using anti-ferroelectric capacitors for high-speed and high-density embedded memory
SC Chang, N Haratipour, S Shivaraman, C Neumann, S Atanasov, J Peck, ...
2021 IEEE International Electron Devices Meeting (IEDM), 33.2. 1-33.2. 4, 2021
212021
Multi-layer MoTe2 p-channel MOSFETs with high drive current
N Haratipour, SJ Koester
72nd Device Research Conference, 171-172, 2014
182014
Black phosphorus n-MOSFETs with record transconductance
N Haratipour, MC Robbins, SJ Koester
2015 73rd Annual Device Research Conference (DRC), 243-244, 2015
172015
A physics-based compact model for ultrathin black phosphorus FETs—Part II: Model validation against numerical and experimental data
E Yarmoghaddam, N Haratipour, SJ Koester, S Rakheja
IEEE Transactions on Electron Devices 67 (1), 397-405, 2019
142019
The effect of output-input isolation on the scaling and energy consumption of all-spin logic devices
J Hu, N Haratipour, SJ Koester
Journal of Applied Physics 117 (17), 2015
132015
Hafnia-based FeRAM: a path toward ultra-high density for next-generation high-speed embedded memory
N Haratipour, SC Chang, S Shivaraman, C Neumann, YC Liao, ...
2022 International Electron Devices Meeting (IEDM), 6.7. 1-6.7. 4, 2022
112022
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